The influence of oxygen flow ratio on the optoelectronic properties of p-type Ni<inf>1-x</inf>O films deposited by ion beam assisted sputtering

Sun, H.H.SunChen, S.-C.S.-C.ChenPeng, W.-C.W.-C.PengWen, C.-K.C.-K.WenWang, X.X.WangChuang, T.-H.T.-H.ChuangTUNG-HAN CHUANG2020-05-122020-05-122018https://scholars.lib.ntu.edu.tw/handle/123456789/491954[SDGs]SDG6[SDGs]SDG7The influence of oxygen flow ratio on the optoelectronic properties of p-type Ni<inf>1-x</inf>O films deposited by ion beam assisted sputteringjournal article10.3390/coatings80501682-s2.0-85051588949https://www.scopus.com/inward/record.uri?eid=2-s2.0-85051588949&doi=10.3390%2fcoatings8050168&partnerID=40&md5=cbaf69791deca5ef5a938a76a29817eb