He J.L.Won K.W.Chang C.T.Chen K.C.Lin H.C.HSIN-CHIH LIN2019-11-272019-11-27199900431648https://www.scopus.com/inward/record.uri?eid=2-s2.0-0033368172&doi=10.1016%2fS0043-1648%2899%2900202-1&partnerID=40&md5=26ef1748dbcb62ca8ce72a43fad464c4https://scholars.lib.ntu.edu.tw/handle/123456789/432528Cavitation-resistant TiNi films deposited by using cathodic arc plasma ion platingconference paper10.1016/S0043-1648(99)00202-12-s2.0-0033368172