Dry Etching of Si Field Emitters and High Aspect Ratio Resonators Using an Inductively Coupled Plasma Source

M. R. RakhshehrooJ. W. WeigoldW. -C. TianS. W. PangWEI-CHENG TIAN2018-09-102018-09-101998-09http://scholars.lib.ntu.edu.tw/handle/123456789/342831Dry Etching of Si Field Emitters and High Aspect Ratio Resonators Using an Inductively Coupled Plasma Sourcejournal article10.1116/1.5902832-s2.0-0000249570WOS:000076487900047