2014-01-012024-05-17https://scholars.lib.ntu.edu.tw/handle/123456789/680818摘要：我們利用均質化氟化氪準分子雷射系統及二氧化矽模具輔助法於塊材矽基板上製作出矽光學波導結構。首先於塊材矽基板上蝕刻出脊狀結構，接著利用電漿增強化學氣相沉積 (Plasms Enhanced Chemical Vapor Deposition, PECVD)製作二氧化矽模具，再以準分子雷射產生的高能短脈衝照射脊狀結構頂部，使其在極短時間內融化並重新形成，重新形成時矽會因本身的表面張力而變成圓形，最後將此結構進行高溫氧化，即可產生以矽為核心，二氧化矽為覆蓋層之波導。 此方法克服了傳統矽光子元件僅能在較昂貴的SOI 基板上製作的限制，透過CMOS 相容的製程，製作出的光學波導元件可以與微電子元件進行單晶片整合，使矽光子元件系統在半導體工業可以更廣泛地被應用。另一方面，模具輔助法在製程上具有易於調控結構尺寸的優勢，並解決了準分子雷射處理在製作較小線寬結構時遭遇的結構起伏問題，提供了穩定且更具彈性的結構設計方法。在恰當的製程條件下製作出的矽光學波導結構允許單一光模態的傳輸，其傳輸損耗可降至每公分2.23 dB。由於與基板隔絕距離超過1 微米，此波導元件具有可忽略的基板耦合損耗，可在塊材矽基板上傳輸光學訊號，達到矽基板上的光學系統應用。 <br> Abstract: We present a novel manufacturing process to fabricate silicon-core waveguide directly on bulk silicon substrate by applying mold-assisted excimer laser treatment. First, we use reactive ion etching (RIE) to form ridge structure on the substrate. Then we produce silicon dioxide mold using plasma enhanced chemical vapor etching (PECVD). The sample is subsequently illuminated by the high energy excimer laser pulse, which leads to an instantaneously melting and solidification at the top of the ridge. During solidification, the top of the ridge becomes a cylinder due to surface tension. Finally, the sample is thermally oxidized under 1200°C for 12 hours. After thermal oxidation, the cylindrical structure becomes a Si-SiO2 waveguide. Also, the remaining ridge is totally oxidized, so the waveguide is separated from the substrate to avoid unnecessary coupling. The dimensions of the fabricated waveguide are adjustable by designing the dimensions of the oxide mold and the original ridge structure. On the other hand, after laser treatment, RIE-induced surface roughness can be reduced significantly, so the propagation loss of the waveguide diminishes. Under proper process condition, the fabricated waveguide support single mode operation with an estimated propagation loss of 2.23 dB/cm. This method overcomes the major disadvantages of conventional silicon photonics, which is only realizable on expensive silicon-on-insulator (SOI) substrates. Moreover, combining with CMOS-compatible processes, the fabricated optical waveguides could be monolithically integrated with microelectronic components and thus be widely applied in semiconductor industry.矽光學波導結構準分子雷射系統二氧化矽模具輔助法反應式離子蝕刻法電漿增強化學氣相沉積傳輸損耗SOI 基板上CMOS相容製程silicon-core waveguideexcimer laser treatmentsilicon dioxide mold-assisted treatmentreactive ion etching (RIE)Plasms Enhanced Chemical Vapor Deposition(PECVD)propagation losssilicon-on-insulator (SOI) substratesCMOS-compatible processes,國際合作研究計畫與境外頂尖大學簽訂策略聯盟【矽光子元件和應用】