周雍強2006-07-252018-06-292006-07-252018-06-291999http://ntur.lib.ntu.edu.tw//handle/246246/4173晶圓廠整體設備效能損耗的原因主要是設 備速率或負載損失、設定轉換、機台閒置、品質 損失、設備維修、測試晶片佔用等。針對這些損 耗的原因，本計畫探討設備監看、預防保養、工 作區排程、設備組態設計、設備指派運用、整體 效能分析與提昇策略等方面的效能提昇方法。本 計畫之第一年成果包含物件導向工廠模擬器、機 台組態方法與軟體、叢聚式機台的效能分析模型及 工作排序工具、設備之健康指數與預防保養模式。The major categories for equipment effectiveness loss are speed loss, equipment setup, equipment idleness, unsatisfactory product quality, unscheduled downtime, and test wafers. The goal of this project is to develop methodologies, tools, and a management system for enhancing overall equipment effectiveness of wafer fabs. Methods for enhancing equipment effectiveness in the areas of equipment monitoring, dynamic preventive maintenance, job dispatching, tool scheduling, machine assignment, tool portfolio design, and OEE analysis and management are investigated in this project. The preliminary results for the first year include a factory simulator, tool portfolio planning methods and software, analysis and sequencing methods for cluster tools, and equipment health indices and prognosis models.application/pdf62287 bytesapplication/pdfzh-TW國立臺灣大學工業工程學研究所設備整體效能晶圓廠模擬晶圓廠排程組態設計預防保養Overall equipment effectivenessfactory simulationintra-bay schedulingtool portfolio planningequipment health indexpreventive maintenancereporthttp://ntur.lib.ntu.edu.tw/bitstream/246246/4173/1/882212E002061.pdf