The RF characteristics of micromachined coplanar waveguide in 0.13 μm CMOS technology by CMOS compatible ICP dry etching

Wang, T.T.WangLu, S.-S.S.-S.LuLin, Y.-S.Y.-S.LinJuang, Y.-Z.Y.-Z.JuangHuang, G.-W.G.-W.HuangSHEY-SHI LU2018-09-102018-09-102009http://www.scopus.com/inward/record.url?eid=2-s2.0-70349092602&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/350398The RF characteristics of micromachined coplanar waveguide in 0.13 μm CMOS technology by CMOS compatible ICP dry etchingjournal article10.1002/mop.24693