Influence of etching-induced surface damage on device performance with consideration of minority carriers within diffusion length from depletion edge

JENN-GWO HWU2018-09-102018-09-102015http://www.scopus.com/inward/record.url?eid=2-s2.0-84921751438&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/391186Influence of etching-induced surface damage on device performance with consideration of minority carriers within diffusion length from depletion edgejournal article10.1109/TED.2014.2382651