DSA-compliant routing for two-dimensional patterns using block copolymer lithography

Su, Y.-H.Y.-H.SuChang, Y.-W.Y.-W.Chang2019-04-222019-04-222016https://www.scopus.com/inward/record.uri?eid=2-s2.0-85000963090&doi=10.1145%2f2966986.2967025&partnerID=40&md5=134259ca91993112b1061d690e61e9f4https://scholars.lib.ntu.edu.tw/handle/123456789/405645DSA-compliant routing for two-dimensional patterns using block copolymer lithographyconference paper10.1145/2966986.2967025