Residue-free fabrication of high-performance graphene devices by patterned PMMA stencil mask

Shih F.-Y.Chen S.-Y.Liu C.-H.Ho P.-H.Wu T.-S.Chen C.-W.Chen Y.-F.YANG-FANG CHENCHUN-WEI CHEN2019-11-272019-11-27201421583226https://www.scopus.com/inward/record.uri?eid=2-s2.0-84902438214&doi=10.1063%2f1.4884305&partnerID=40&md5=7a3995fb2ab83a0dfe0683187d2cbc9bhttps://scholars.lib.ntu.edu.tw/handle/123456789/432815Residue-free fabrication of high-performance graphene devices by patterned PMMA stencil maskjournal article10.1063/1.48843052-s2.0-84902438214