Thermally induced morphology evolution of pit-patterned Si substrate and its effect on nucleation properties of Ge dots

CHIEH-HSIUNG KUANChen, H.-M.H.-M.ChenKuan, C.-H.C.-H.KuanSuen, Y.-W.Y.-W.SuenLuo, G.-L.G.-L.LuoLai, Y.-P.Y.-P.LaiWang, F.-M.F.-M.WangChen, S.-T.S.-T.ChenCHIEH-HSIUNG KUAN2018-09-102018-09-102012http://www.scopus.com/inward/record.url?eid=2-s2.0-83455211766&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/372472[SDGs]SDG6Thermally induced morphology evolution of pit-patterned Si substrate and its effect on nucleation properties of Ge dotsjournal article10.1088/0957-4484/23/1/015303