Interfacial reactions of rf-sputtered TiNi thin films on (100) silicon with a SiN diffusion barrier

Wu, S.K.S.K.WuSu, J.J.J.J.SuWang, J.Y.J.Y.WangWuSK2008-11-192018-06-282008-11-192018-06-282004http://ntur.lib.ntu.edu.tw//handle/246246/86895application/pdf657845 bytesapplication/pdfen-USInterfacial reactions of rf-sputtered TiNi thin films on (100) silicon with a SiN diffusion barrierjournal articlehttp://ntur.lib.ntu.edu.tw/bitstream/246246/86895/1/113.pdf