Lay, E.E.LaySong, Y.-H.Y.-H.SongChiu, Y.-C.Y.-C.ChiuLin, Y.-M.Y.-M.LinChi, Y.Y.ChiCarty, A.J.A.J.CartySHIE-MING PENGLee, G.-H.G.-H.Lee2018-09-102018-09-102005http://www.scopus.com/inward/record.url?eid=2-s2.0-26944492131&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/315173[SDGs]SDG6New CVD precursors capable of depositing copper metal under mixed O 2/Ar atmospherejournal article10.1021/ic050845h2-s2.0-26944492131