Maikap, S.S.MaikapTzeng, P. J.P. J.TzengWang, T. Y.T. Y.WangLee, H. Y.H. Y.LeeLin, C. H.C. H.LinWang,? C. C.WangLee, L. S.L. S.LeeYang, J. R.J. R.YangTsai, M. J.M. J.Tsai2008-12-242018-06-282008-12-242018-06-282007http://ntur.lib.ntu.edu.tw//handle/246246/93247application/pdf201316 bytesapplication/pdfen-USHfO2/HfAlO/HfO2 nanolaminate charge trapping layers for high-performance nonvolatile memory device applicationsjournal articlehttp://ntur.lib.ntu.edu.tw/bitstream/246246/93247/1/8.pdf