In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam-direct-write lithography

CHIEH-HSIUNG KUANTsai, Kuen-YuKuen-YuTsaiYUNG-YAW CHENJIA-YUSH YEN2018-09-102018-09-102011http://www.scopus.com/inward/record.url?eid=2-s2.0-80051896567&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/364926In situ beam drift detection using a two-dimensional electron-beam position monitoring system for multiple-electron-beam-direct-write lithographyjournal article10.1116/1.36136972-s2.0-80051896567WOS:000293854800026