Investigation of defects in ultra-thin Al 2 O 3 films deposited on pure copper by the atomic layer deposition technique

Chang M.L.Wang L.C.Lin H.C.Chen M.J.Lin K.M.2019-11-272019-11-27201501694332https://www.scopus.com/inward/record.uri?eid=2-s2.0-84961782222&doi=10.1016%2fj.apsusc.2015.10.144&partnerID=40&md5=80df6b9520e44fa5fa423f7d99eef473https://scholars.lib.ntu.edu.tw/handle/123456789/432421Investigation of defects in ultra-thin Al 2 O 3 films deposited on pure copper by the atomic layer deposition techniquejournal article10.1016/j.apsusc.2015.10.1442-s2.0-84961782222