國立臺灣大學應用力學研究所黃榮山2006-07-262018-06-292006-07-262018-06-292005-07-31http://ntur.lib.ntu.edu.tw//handle/246246/21752奈米壓印(Nanoimprint lithography, NIL)是一種低成本且具有高生產力的非傳 統微影技術。奈米印器（即母模）之製造 上，將採用電子束微影技術及電感式耦合 電漿乾蝕刻的製程進行，製造出高深寬比 之母模結構。壓印設備系統上，將採用熱 壓印技術，進行奈米結構之圖形轉移。The project is aimed at developing the mold fabrication and the imprinting recipe for nano-imprint (NIL). For fabrication of a nano-imprinting mold, the electron beam lithography and ICP(Inductively Coupled Plasma) dry etching will be mainly employed to structure the mold of high aspect ratio. As for the nano-imprinting process, the hot-embossing will be employed, and the molds will be tested to form the nanopatterns, and then replicate the pattern to the polymer on the substrate.application/pdf685457 bytesapplication/pdfzh-TW國立臺灣大學應用力學研究所奈米壓印微機電奈米機電光阻材料NanoimprintHot-embossingElectron beamMoldreporthttp://ntur.lib.ntu.edu.tw/bitstream/246246/21752/1/932218E002015.pdf