Proximity effect correction in electron-beam lithography based on computation of critical-development time with swarm intelligence

ChunNienLi-ChengChangJia-HaoYeVin-CentSuChao-HsinWuChieh-HsiungKuanCHAO-HSIN WU2019-10-312019-10-31201721662746https://scholars.lib.ntu.edu.tw/handle/123456789/429858[SDGs]SDG9Proximity effect correction in electron-beam lithography based on computation of critical-development time with swarm intelligencejournal article10.1116/1.50016862-s2.0-85029322762