Demonstration of large field effect in topological insulator films via a high-庥 back gate

Wang, C.Y.C.Y.WangLin, H.Y.H.Y.LinYang, S.R.S.R.YangChen, K.H.M.K.H.M.ChenLin, Y.H.Y.H.LinChen, K.H.K.H.ChenYoung, L.B.L.B.YoungCheng, C.K.C.K.ChengFanchiang, Y.T.Y.T.FanchiangTseng, S.C.S.C.TsengMINGHWEI HONGKwo, J.J.Kwo2019-12-272019-12-272016https://scholars.lib.ntu.edu.tw/handle/123456789/443319Demonstration of large field effect in topological insulator films via a high-庥 back gatejournal article10.1063/1.49508492-s2.0-84970028629https://www.scopus.com/inward/record.uri?eid=2-s2.0-84970028629&doi=10.1063%2f1.4950849&partnerID=40&md5=78697cbc87d0a99d69ce5ff0247ce6e6