Electron spin resonance study of the effect of applied stress during thermal oxidation of (111)Si on inherent Pb interface defects

Pierreux, D.D.PierreuxStesmans, A.A.StesmansJaccodine, R. J.R. J.JaccodineMINN-TSONG LINDelph, T. J.T. J.Delph2019-12-272019-12-2720040167-9317https://scholars.lib.ntu.edu.tw/handle/123456789/443539Electron spin resonance study of the effect of applied stress during thermal oxidation of (111)Si on inherent Pb interface defectsjournal article10.1016/j.mee.2003.12.019WOS:000221017500015