Double nitridation of crystalline ZrO <inf>2</inf> /Al <inf>2</inf> O <inf>3</inf> buffer gate stack with high capacitance, low leakage and improved thermal stability

Huang, J.-J.J.-J.HuangTsai, Y.-J.Y.-J.TsaiTsai, M.-C.M.-C.TsaiLee, M.-H.M.-H.LeeChen, M.-J.M.-J.ChenMIIN-JANG CHEN2020-05-122020-05-122015https://scholars.lib.ntu.edu.tw/handle/123456789/491748Double nitridation of crystalline ZrO <inf>2</inf> /Al <inf>2</inf> O <inf>3</inf> buffer gate stack with high capacitance, low leakage and improved thermal stabilityjournal article10.1016/j.apsusc.2015.01.0052-s2.0-84924023395https://www.scopus.com/inward/record.uri?eid=2-s2.0-84924023395&doi=10.1016%2fj.apsusc.2015.01.005&partnerID=40&md5=be1591533a2f94311c83f99268fcc12e