Bonding characterization and nano-indentation study of the amorphous SiCxNy films with and without hydrogen incorporation

Lo, H. C.H. C.LoWu, J. J.J. J.WuWen, C. Y.C. Y.WenWong, T. S.T. S.WongLin, S. T.S. T.LinChen, K. H.K. H.ChenSHIANG-TAI LINLI-CHYONG CHEN2020-01-062020-01-0620010925-9635https://scholars.lib.ntu.edu.tw/handle/123456789/445765Bonding characterization and nano-indentation study of the amorphous SiCxNy films with and without hydrogen incorporationjournal article10.1016/S0925-9635(01)00421-6WOS:000170775900070