Submicron patterns on sapphire substrate produced by dual layer photoresist complimentary lithography

Chang, C.-M.C.-M.ChangShiao, M.-H.M.-H.ShiaoChiang, D.D.ChiangYang, C.-T.C.-T.YangHuang, M.-J.M.-J.HuangCheng, C.-T.C.-T.ChengHsueh, W.-J.W.-J.HsuehWEN-JENG HSUEH2020-01-172020-01-172013https://scholars.lib.ntu.edu.tw/handle/123456789/451911[SDGs]SDG9Submicron patterns on sapphire substrate produced by dual layer photoresist complimentary lithographyconference paper10.4028/www.scientific.net/AMM.284-287.3342-s2.0-84873904125https://www.scopus.com/inward/record.uri?eid=2-s2.0-84873904125&doi=10.4028%2fwww.scientific.net%2fAMM.284-287.334&partnerID=40&md5=816a065173eb7f8c4b906ab79878f3c7