Effect of Fluorine on the Radiation Hardness of Gate Oxides Prepared by Liquid Phase Deposition Following Rapid Thermal Oxidation

胡振國Lu, W. S.W. S.LuHwu, Jenn-GwoJenn-GwoHwu2009-04-272018-07-062009-04-272018-07-061994http://ntur.lib.ntu.edu.tw//handle/246246/153897en-USEffect of Fluorine on the Radiation Hardness of Gate Oxides Prepared by Liquid Phase Deposition Following Rapid Thermal Oxidationreport