劉正良臺灣大學：機械工程學研究所吳佩璁Wu, Pei-TsungPei-TsungWu2007-11-282018-06-282007-11-282018-06-282007http://ntur.lib.ntu.edu.tw//handle/246246/61508定位技術是工業上對於製造產品、量測物體尺寸、運轉使用各種機器的基本要求。在生產上對於製造精度的需求，已經從早期幾十微米，進步到奈米級的加工製造精度。以台灣晶圓代工龍頭台積電來說，在九五年十二月時，32奈米製程已進入晶圓模型測試階段。所以高科技產業對於精密定位的精度需求，也循著摩爾定律不斷地提升。 但對傳統機械加工之精密定位而言，要達到奈米級的精度是十分困難的。因為機器運轉與加工時所引發的振動，機台組裝的誤差，工作軸定位的誤差，或者是加工環境與加工應力的影響，都是導致精度受限的原因。不過在量測領域的應用上，大多是屬於輕負荷，所以要求能有高精密定位及高解析度位移的奈米級技術，是較有可能實現的。因此研究能具精密定位的移動平台和高靈敏度與準確度的位置感測器，將是一個值得開發的領域。 本文利用壓電陶瓷線性馬達(Piezoelectric Ceramic Linear Motor)來作為致動器，發展出一種Ｚ軸獨立，Ｘ-Ｙ軸組合在一起，具有長行程的精密三軸移動台。一般Ｘ-Ｙ軸平台，多以兩個一維的單軸平台以堆疊的方式組合而成，且以粗/細平台整合方式來達成長行程定位。而在本研究中擬以共平面平台(Coplanar Stage)的原理來設計一個雙軸的XY平台，以減低因堆疊所引起的阿貝誤差(Abbé error)，並利用可以長行程移動並精密定位的壓電陶瓷馬達來取代粗細平台整合的定位方式。 最後以線性繞射光柵干涉儀(Linear Diffraction Grating Interferometer)做為本機台的位置檢測元件。它能輸出穩定的高解析度位移訊號，以完成具零阿貝誤差的精密三軸移動台。Positioning technique is the basic requirement in manufacturing, measuring, and operating machines. Recently, the need of fabrication precision has progressed from micrometer to nanometer. However, it’s rather difficult for traditional industry to achieve the requirement of nanometer level because the vibration of operating machines and the errors of assembling machines or the influences of process environment and process stress make the limit. But it’s more probable for measuring to acquire the nano-degree technology of precise positioning. Thus, it’s worthwhile to develop a movable platform with precise locating function and a location finder with high sensitivity and accuracy. This work brings out the idea to use piezoelectric ceramic linear motor(PCLM) as the actuator and to develop a three-axis long range movable platform composing an independent Z-axis and formed X-axis and Y-axis. Conventionally, the X-Y axes platform stack by two one-dimensional single axis platforms. However, this work was the theory of coplanar stage to design a double X-Y-axes platform in order to decrease the Abbé error. In the same time, this research take compact linear diffraction grating interferometer as local detection device of this machine.It outputs a series of steady precise analytical displacement signals and proves a precison Abbé-free three-axis moving stage of this machine.摘 要 .................................................I Abstract ................................................II 目錄 ...............................................III 圖目錄 ................................................VI 表目錄 ...............................................XII 第一章 緒論...............................................1 1-1 研究動機與目的......................................1 1-2 文獻回顧與探討......................................3 1-2-1 移動台文獻回顧與探討............................3 1-2-2 雷射干涉儀文獻回顧與探討.......................11 1-3 論文架構...........................................14 第二章 超音波馬達之原理與驅動............................17 2-1 壓電效應原理.......................................17 2-2 壓電材料之應用.....................................20 2-3 Nanomotion超音波馬達...............................23 2-4 超音波馬達驅動器AB2 Driver介紹.....................28 2-4-1 AB2 Driver介紹.................................28 2-4-2 AB2 Driver驅動模式說明.........................29 第三章 線性繞射光柵干涉儀系統之原理與製作................33 3-1 干涉原理...........................................33 3-1-1 光柵繞射與都卜勒效應...........................34 3-1-2 光波干涉原理...................................36 3-2 光學系統之設計.....................................38 3-2-1 光路設計原理...................................38 3-2-2 光路架構 .......................................42 3-2-3 光路理論推導...................................44 3-3 線性繞射光柵干涉儀之元件介.........................47 3-3-1 反射式光柵.....................................47 3-3-2 雷射二極體.....................................48 3-3-3 光學鏡組元件...................................51 3-3-4 光偵測器.......................................52 3-4 光學系統安裝機構設計...............................52 第四章 精密三軸移動台之設計與分析........................57 4-1 精密定位技術的意義.................................57 4-2 精密三軸移動台設計流程.............................61 4-2-1 設計流程.......................................62 4-2-2 三次元量測儀之主結構...........................64 4-3 Z軸移動台之設計....................................68 4-3-1 配重設計.......................................68 4-3-2 交叉滾子滑軌之設計.............................69 4-3-3 驅動位置之選擇.................................71 4-3-4 其他設計要項...................................72 4-4 X、Y二維移動台之設計...............................73 4-4-1 共平面運動之概念...............................73 4-4-2 自由度計算.....................................75 4-4-3 構造簡圖與拓樸構造.............................76 4-4-4 二維共平面移動台之設計.........................80 第五章 實驗結果..........................................83 5-1 線性繞射光柵干涉...................................83 5-1-1 組裝工具.......................................83 5-1-2 系統光學元件之姿態調整.........................86 5-1-3 訊號處理.......................................92 5-2 三軸移動台.........................................93 5-2-1 Z軸移動台組裝..................................94 5-2-2 XY二維共平面移動台.............................96 5-3 實驗量測結果.......................................97 5-3-1 線性繞射光柵干涉儀.............................97 5-3-2 三軸移動台.....................................99 第六章 結論與未來展望...................................107 6-1 結論..............................................107 6-2 未來展望..........................................110 參考文獻................................................113 附錄 A 都卜勒頻移效應...................................123 A-1 都卜勒效應........................................123 A-2 雙重都卜勒效應....................................123 A-3 移動繞射光柵的都卜勒頻移效應......................125 附錄 B 光干涉原理.......................................127 B-1 光波..............................................127 B-3 光干涉現象........................................130 B-3 拍頻現象..........................................131 附錄 C 相關設備元件之規格...............................1375446363 bytesapplication/pdfen-US共平面平台壓電陶瓷線性馬達阿貝誤差線性繞射光柵干涉儀coplanar stagepiezoelectric ceramic linear motorAbb&eacuteerrorlinear diffraction grating interferometethesishttp://ntur.lib.ntu.edu.tw/bitstream/246246/61508/1/ntu-96-R93522638-1.pdf