Emission wavelength control of Si-rich SiO<inf>x</inf> MOSLED by detuning vapor fluence and plasma power during PECVD growth

Lai, B.-H.B.-H.LaiPai, Y.-H.Y.-H.PaiLiu, C.-W.C.-W.LiuGONG-RU LIN2018-09-102018-09-102008http://www.scopus.com/inward/record.url?eid=2-s2.0-70350316028&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/340880Emission wavelength control of Si-rich SiO<inf>x</inf> MOSLED by detuning vapor fluence and plasma power during PECVD growthconference paper