Real-time spatial control of steady-state wafer temperature during thermal processing in microlithography

Arthur TayWeng-Khuen HoNi HuKuen-Yu TsaiYing ZhouKUEN-YU TSAI2018-09-102018-09-102006-03http://scholars.lib.ntu.edu.tw/handle/123456789/325532Real-time spatial control of steady-state wafer temperature during thermal processing in microlithographyconference paper10.1117/12.6547412-s2.0-33745782955