Refractive index, absorbance and thickness measurement of underlayer materials for the EUV lithography at 13.5-nm

Fu-Hsiu KangGrace.H. Ho*Hok-Sum FungHuang-Wen FuChia-Chun HungJIA-HAN LI2022-01-032022-01-032008https://scholars.lib.ntu.edu.tw/handle/123456789/590937Refractive index, absorbance and thickness measurement of underlayer materials for the EUV lithography at 13.5-nmtechnical report