Highly thermally stable and reproducible of ALD RuO<inf>2</inf> nanocrystal floating gate memory devices with large memory window and good retention

Maikap, S.S.MaikapBanerjee, W.W.BanerjeeTzeng, P.-J.P.-J.TzengWang, T.-Y.T.-Y.WangLin, C.H.C.H.LinTien, T.C.T.C.TienLee, L.S.L.S.LeeYang, J.-R.J.-R.YangKao, M.-J.M.-J.KaoTsai, M.-J.M.-J.TsaiJER-REN YANG2020-05-122020-05-122008https://scholars.lib.ntu.edu.tw/handle/123456789/491620Highly thermally stable and reproducible of ALD RuO<inf>2</inf> nanocrystal floating gate memory devices with large memory window and good retentionconference paper10.1109/VTSA.2008.45307932-s2.0-49049088914https://www.scopus.com/inward/record.uri?eid=2-s2.0-49049088914&doi=10.1109%2fVTSA.2008.4530793&partnerID=40&md5=708a526477dd78d6c710fc7bd3f0d74f