Huang, L.-T.L.-T.HuangChang, M.-L.M.-L.ChangHuang, J.-J.J.-J.HuangLin, H.-C.H.-C.LinKuo, C.-L.C.-L.KuoLee, M.-H.M.-H.LeeCHEE-WEE LIUMIIN-JANG CHEN2020-05-122020-05-122013https://scholars.lib.ntu.edu.tw/handle/123456789/491767[SDGs]SDG6[SDGs]SDG7Improvement in electrical characteristics of HfO <inf>2</inf> gate dielectrics treated by remote NH <inf>3</inf> plasmajournal article10.1016/j.apsusc.2012.11.0972-s2.0-84872789354https://www.scopus.com/inward/record.uri?eid=2-s2.0-84872789354&doi=10.1016%2fj.apsusc.2012.11.097&partnerID=40&md5=b4ef9d0bcdd3680096e0ec59ac3cdfc2