Porous materials with ultra-low dielectric constant as antireflective coating layers for F 2 and ArF lithography

Chen, H.L.H.L.ChenTu, C.W.C.W.TuWang, T.J.T.J.WangLiu, P.T.P.T.LiuKo, F.H.F.H.KoChung, T.C.T.C.ChungHSUEN-LI CHEN2020-05-122020-05-122003https://scholars.lib.ntu.edu.tw/handle/123456789/491373Porous materials with ultra-low dielectric constant as antireflective coating layers for F 2 and ArF lithographyconference paper10.1109/IMNC.2003.12686062-s2.0-84949223894https://www.scopus.com/inward/record.uri?eid=2-s2.0-84949223894&doi=10.1109%2fIMNC.2003.1268606&partnerID=40&md5=3205d7420970d9b9ca216e74479d6ee7