Co-dosing Ozone and Deionized Water as Oxidant Precursors of ZnO Thin Film Growth by Atomic Layer Deposition

Cheng, Y.-C.Y.-C.ChengWang, H.-C.H.-C.WangFeng, S.-W.S.-W.FengLi, T.-P.T.-P.LiFung, S.-K.S.-K.FungYuan, K.-Y.K.-Y.YuanChen, M.-J.M.-J.ChenMIIN-JANG CHEN2021-02-042021-02-042020https://www.scopus.com/inward/record.url?eid=2-s2.0-85088776922&partnerID=40&md5=3e686b44523b937049264156606172fehttps://scholars.lib.ntu.edu.tw/handle/123456789/546711Co-dosing Ozone and Deionized Water as Oxidant Precursors of ZnO Thin Film Growth by Atomic Layer Depositionjournal article10.1186/s11671-020-03382-1327289642-s2.0-85088776922WOS:000558436800001