Hsu, C.-H.C.-H.HsuChang, Y.-W.Y.-W.ChangNassif, S.R.S.R.NassifYAO-WEN CHANG2018-09-102018-09-102010http://www.scopus.com/inward/record.url?eid=2-s2.0-78650912407&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/358157Template-mask design methodology for double patterning technologyconference paper10.1109/ICCAD.2010.56542882-s2.0-78650912407