國立臺灣大學應用力學研究所翁宗賢2006-07-262018-06-292006-07-262018-06-292002-07-31http://ntur.lib.ntu.edu.tw//handle/246246/21650本計畫探討水平式快速熱處理機台內 的暫態熱流現象，建構熱模擬機台，能以 鹵素燈管快速加熱八吋晶圓，由晶圓背面 觀測紅外線影像，推測溫度分佈。本計畫 並建立數值模式，經由計算以瞭解半導體 快速熱製程中的參數效應，期以提高晶圓 製程中的溫度均勻性。由數值計算探討發 現在晶圓上方加裝鍍金的反射環，能最有 效地補償熱輻射損失;若在反射環選擇區 域鍍金時，則晶圓表面的溫差可控制在攝 氏數度之內。This project investigated transient heat transfer in a RPT. A thermal model was built which can simulate rapid thermal processing up to 8-inch wafer. Temperature distribution of the wafer can be deduced from infrared images acquired through a backside window. Numerical computations also carried out to explore parametric influences. Results show that a gold platted ring reflector can effectively compensate radiation heat losses. A ring reflector with properly regional platted can reduce temperature variation down to a few degrees.application/pdf482088 bytesapplication/pdfzh-TW國立臺灣大學應用力學研究所快速熱製程暫態熱流熱輻射混合熱對流rapid thermal processingtransient flowthermal radiationmixed convectionreporthttp://ntur.lib.ntu.edu.tw/bitstream/246246/21650/1/902212E002227.pdf