Atomic layer chemical patterns for block copolymer assembly

Paul Franklin NealeyTzu-Hsuan ChangShisheng XiongZhenqiang MaMichael Scott ArnoldRobert JacobbergerTZU-HSUAN CHANG2019-10-312019-10-312018https://scholars.lib.ntu.edu.tw/handle/123456789/429216Atomic layer chemical patterns for block copolymer assemblypatentUnited States