Maikap, S.S.MaikapWang, T.Y.T.Y.WangTzeng, P.J.P.J.TzengLin, C.H.C.H.LinTien, T. C.T. C.TienLee, L. S.L. S.LeeYang, J. R.J. R.YangTsai, M.J.M.J.Tsai2008-12-242018-06-282008-12-242018-06-282007http://ntur.lib.ntu.edu.tw//handle/246246/93245application/pdf408265 bytesapplication/pdfen-USBand offsets and charge storage characteristics of atomic layer deposited high-k HfO2/TiO2 multilayersjournal articlehttp://ntur.lib.ntu.edu.tw/bitstream/246246/93245/1/6.pdf