Interfacial self-cleaning in atomic layer deposition of HfO 2 gate dielectric on In 0.15 Ga 0.85 As

Chang, CHCHChangChiou, YKYKChiouChang, YCYCChangLee, KYKYLeeLin, TDTDLinWu, TBTBWuMINGHWEI HONGKwo, JJKwo2018-09-102018-09-102006http://scholars.lib.ntu.edu.tw/handle/123456789/323260Interfacial self-cleaning in atomic layer deposition of HfO 2 gate dielectric on In 0.15 Ga 0.85 Asjournal article