DSA-Compliant Routing for 2-D Patterns Using Block Copolymer Lithography

Su, Y.-H.Y.-H.SuChang, Y.-W.Y.-W.Chang2019-05-162019-05-162019https://www.scopus.com/inward/record.uri?eid=2-s2.0-85042845741&doi=10.1109%2fTCAD.2018.2812122&partnerID=40&md5=0c7d829edbf3e76e82b002ca226688e4https://scholars.lib.ntu.edu.tw/handle/123456789/408571DSA-Compliant Routing for 2-D Patterns Using Block Copolymer Lithographyjournal article10.1109/TCAD.2018.28121222-s2.0-85042845741