Huang L.-T.Lin M.-C.Chang M.-L.Wang R.-R.Lin H.-C.HSIN-CHIH LIN2019-11-272019-11-27200900406090https://www.scopus.com/inward/record.uri?eid=2-s2.0-65449181905&doi=10.1016%2fj.tsf.2009.02.045&partnerID=40&md5=4a33910f1a9d9fdecf33049da038943fhttps://scholars.lib.ntu.edu.tw/handle/123456789/432466Aluminum oxynitride (AlOxNy) films were deposited on polyethylene naphthalate (PEN) substrates using a reactive radio frequency (RF) magnetron sputtering system by varying the nitrogen flow rate. Experimental results show that the AlOxNy films deposited on PEN substrate exhibit a pebble-like surface morphology. The deposition rate decreases slightly upon increasing the nitrogen flow rate. The surface roughness of the deposited AlOxNy films also decreases upon increasing the nitrogen flow rate. The AlOxNy film deposited at a nitrogen flow rate of 15 sccm exhibited the lowest water vapor transmission rate of 0.02 g/m2·day. Meanwhile, the passivation of AlOxNy films can effectively improve the long-term stability of plastic DSSC. Their power conversion efficiency can sustain 50% of the initial values even after 300 h. © 2009 Elsevier B.V. All rights reserved.Aluminum oxynitride film; Dye-sensitized solar cells; Gas permeation; Polyethylene naphthalate; Reactive magnetron sputtering[SDGs]SDG7Aluminum oxynitride film; Dye-sensitized solar cells; Gas permeation; Polyethylene naphthalate; Reactive magnetron sputtering; Alumina; Aluminum; Cell membranes; Conversion efficiency; Flow rate; Magnetron sputtering; Magnetrons; Nitrides; Nitrogen; Passivation; Photoelectrochemical cells; Photovoltaic cells; Solar cells; Solar energy; Substrates; Surface roughness; Thermoplastics; Water vapor; Gas permeable membranesjournal article10.1016/j.tsf.2009.02.0452-s2.0-65449181905