2007-08-012024-05-18https://scholars.lib.ntu.edu.tw/handle/123456789/708160摘要：全氟辛酸(PFOA、PFOS)是一系列全氟化合物(PFCs)，其最有名的使用在於生產鐵氟龍與其他抗沾污材質。由於化合物具有生物代謝緩慢與化學鈍性，以致於難以在環境中降解，以PFOS為例，在人體內的半生期高達1428天，並且在野生動物如魚類、鳥類與哺乳動物體內被測出這些化合物的存在。許多的文獻證實特定全氟化合物的毒性特性，如PFOS對老鼠與猴子具有毒性，其毒性影響包括致死性、致癌性，促使甲狀腺、胰臟與生殖功能發生病變。 全氟化合物（PFCs）是一種完全由人工合成製造，在自然環境原本並不存在的化學物質，由於碳氟間鍵結（C-F）在環境中具有極高的穩定性，據知到目前為止沒有任何在自然環境中天然降解的方法，若將PFOA或PFOS加在硫酸或硝酸中，經加熱沸騰後一段時間後，找不到任何碳氟間鍵結斷裂的跡象。以熱破壞方法去除PFOA或PFOS，必須有達到1200℃的高溫才可能進行。 由於全氟化合物的高穩定性導致在環境中持久性的污染，世界最大的全氟化合物製造商已於西元2000年終止PFOS的生產製造，但對於半導體工業製程的表面處理仍須使用大量的全氟化合物，因此發展其相關的高效率去除處理流程已成為現在必須要做的重要課題。 文獻中未曾以超音波光化學法或微波法破壞去除PFOA、PFOS，本研究計畫就是以能量波（energy wave），包括光化學法（photochemical process）、超音波化學(sonochemistry) 、微波（microwave）與超音波光化學法（sonophotochemical process）等方法並加入氧化劑（如H2O2 與Na2S2O8等），發展新的、適宜的、更高效率的破壞去除PFCs方法研究。 <br> Abstract: Perfluorooctanoic acid (C7F15COOH, PFOA) and perfluorooctane sulfonate acid (C8F17SO3-,PFOS) are a class of perfluorinated chemicals(PFCs) that are best known for their use in the production of Teflon and other stain resistant materials. Furthermore, these compounds are metabolically and chemically inert, resisting both biotic and abiotic degradation. The publicly available data on PFOS persistence in humans is the half-life (t1/2) value reported to be approximately 1428 days. As a consequence, they have been detected in wildlife, such as fish, birds, and mammals, from urban and remote areas around the world. Various studies have demonstrated toxicity of certain PFCs, including PFOS toxicity to rats and monkeys, and the toxic effects include mortality, carcinogenicity, and adverse effects on development, thyroid functions, pancreatic functions, and reproduction. These anthropogenic compounds, whose high stability is ascribed to their C-F bonds, have no know natural decomposition processes. When the compounds are boiled in nitric acid or sulfuric acid, no sign of C-F bond cleavage is observed. To thermally decompose them, high temperatures (～1200℃) are required. Their high stability consequently results in environmental persistence. The largest fluorochemical manufacturer ceased most PFOS production in the year 2000. However, it is still a necessity in the semiconductor industry as surface treatment agents (photoacid generator, antireflective coating agent, etc.) Therefore, these compounds are regarded as potential hazards to human health, and it is very important to develop a method for the decomposition of PFOA and PFOS in order to avoid the discharge and polluting. In this study, we attempt to decompose the PFOA/PFOS by energy wave, including photochemical、sonophotochemical、sonophotochemical and microwave(MW) methods. In the literature, there are no reports on the study of PFCs destruction combining ultrasound(US) and ultraviolent(UV), neither on PFOA/PFOS . This work compare the various combinations of UV, US, UV/US,MW and GAC/MW process are utilized to investigate the degradation efficiency of the PFOA/PFOS. To discuss the difference of the optimum operating parameters caused by pH, initial concentration , reaction time,the presence of H2O2,and S2O82- which leads to the change of decomposition efficiency.全氟化辛酸光化學微波超音波Perfluorooctanoic acidperfluorooctane sulfonate acidphotochemicalsonochemicalmicrowave