Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Process

Liu, Iou-JenIou-JenLiuFang, Shao-YunShao-YunFangYAO-WEN CHANG2020-06-162020-06-1620160278-0070https://scholars.lib.ntu.edu.tw/handle/123456789/501954Overlay-Aware Detailed Routing for Self-Aligned Double Patterning Lithography Using the Cut Processjournal article10.1109/TCAD.2015.2513670WOS:000384232100011