Chen, Tze ChiangTze ChiangChenPeng, Cheng-YiCheng-YiPengTseng, Chih-HungChih-HungTsengLiao, Ming-HanMing-HanLiaoChen, Mei-HsinMei-HsinChenWu, Chih-IChih-IWuChern, Ming-YauMing-YauChernTzeng, Pei-JerPei-JerTzengLiu, Chee WeeChee WeeLiu2009-03-252018-07-062009-03-252018-07-062007http://ntur.lib.ntu.edu.tw//handle/246246/148250http://ntur.lib.ntu.edu.tw/bitstream/246246/148250/1/79.pdfapplication/pdf605045 bytesapplication/pdfen-USCharacterization of the Ultrathin HfO2 and Hf-Silicate Films Grown by Atomic Layer Depositionjournal article10.1109/TED.2007.892012WOS:000245327900019http://ntur.lib.ntu.edu.tw/bitstream/246246/148250/1/79.pdf