Reducing Si reflectance by improving density and uniformity of Si nanowires fabricated by metal-assisted etching

Shiu, S.-C.S.-C.ShiuLin, S.-B.S.-B.LinCHING-FUH LIN2018-09-102018-09-102010http://www.scopus.com/inward/record.url?eid=2-s2.0-84894055646&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/357954Reducing Si reflectance by improving density and uniformity of Si nanowires fabricated by metal-assisted etchingconference paper