Reduction of Polarization and Swing Effects in a High Numerical Aperture Exposure System by utilizing Resist Antireflective Coatings

Chen, H. L.H. L.ChenLee, W. H.W. H.LeeFan, WonderWonderFanChuang, S. Y.S. Y.ChuangLai, Y. H.Y. H.LaiLee, C. C.C. C.Lee2008-12-312018-06-282008-12-312018-06-282008http://ntur.lib.ntu.edu.tw//handle/246246/95633application/pdf852202 bytesapplication/pdfen-USReduction of Polarization and Swing Effects in a High Numerical Aperture Exposure System by utilizing Resist Antireflective Coatingsjournal articlehttp://ntur.lib.ntu.edu.tw/bitstream/246246/95633/1/35.pdf