Efficient three-dimensional resist profile-driven source mask optimization optical proximity correction based on Abbe-principal component analysis and Sylvester equation

Lin, P.-C.P.-C.LinYu, C.-C.C.-C.YuPEI-CHUN LINCHUNG-PING CHEN2020-06-112020-06-112015https://scholars.lib.ntu.edu.tw/handle/123456789/501074Efficient three-dimensional resist profile-driven source mask optimization optical proximity correction based on Abbe-principal component analysis and Sylvester equationjournal article10.1117/1.JMM.14.1.0110062-s2.0-84920681175https://www.scopus.com/inward/record.uri?eid=2-s2.0-84920681175&doi=10.1117%2f1.JMM.14.1.011006&partnerID=40&md5=9834afe0d2dffb7b77794cf88bb8912c