Lin, C.H.C.H.LinHSUEN-LI CHENLON A. WANG2020-05-122020-05-122000https://www.scopus.com/inward/record.uri?eid=2-s2.0-0034314807&doi=10.1116%2f1.1321273&partnerID=40&md5=2f00b6eb3572c153d48f98324ebc65f7The hexamethyldisiloxane (HMDSO) film was demonstrated as a bilayer bottom antireflective coating (BARC) layer for KrF and ArF lithographies. The materials of the bilayer can be varied to have suitable optical constants as BARC materials, by adjusting the gas flow rate ratio. The bilayer was also shown to be capable of providing large thickness controlled tolerance.Antireflection coatings; Chemical vapor deposition; Electron cyclotron resonance; Mathematical models; Photolithography; Plasma etching; Thermal effects; Bottom antireflective coating (BARC); Hexamethyldisiloxane films; Semiconducting filmsjournal article10.1116/1.13212732-s2.0-0034314807