WNxCy VT Tuning of Split Gate Nanosheet CFETs with Dual Work Function Metals Achieving 0.93 VT Match/ Improved 0.24V Noise Margin/ Record Gain of 61V/V

Bo-Wei HuangChun-Yi ChengWan-Hsuan HsiehYu-Rui ChenWei-Jen ChenYi-Chun LiuMin-Kuan LinYing-Qi LiuHao-Yi LuYi HuangDing-Wei LinCHEE-WEE LIU2025-05-192025-05-192024-12-07https://www.scopus.com/record/display.uri?eid=2-s2.0-86000005346&origin=resultslisthttps://scholars.lib.ntu.edu.tw/handle/123456789/729484WNxCy VT Tuning of Split Gate Nanosheet CFETs with Dual Work Function Metals Achieving 0.93 VT Match/ Improved 0.24V Noise Margin/ Record Gain of 61V/Vconference paper10.1109/iedm50854.2024.10873325