Characteristics and reliability of hafnium oxide dielectric stacks with room temperature grown interfacial anodic oxide

Chang, C.-H.C.-H.ChangHwu, J.-G.J.-G.HwuJENN-GWO HWU2018-09-102018-09-102009http://www.scopus.com/inward/record.url?eid=2-s2.0-67650333622&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/347704Characteristics and reliability of hafnium oxide dielectric stacks with room temperature grown interfacial anodic oxidejournal article10.1109/TDMR.2008.2012057