Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structure

Wang W.-C.Tsai M.-C.Lin Y.-P.Tsai Y.-J.Lin H.-C.HSIN-CHIH LINMIIN-JANG CHEN2019-11-272019-11-27201602540584https://www.scopus.com/inward/record.uri?eid=2-s2.0-84992754203&doi=10.1016%2fj.matchemphys.2016.09.054&partnerID=40&md5=846d5f77d905447fcbfa6a98581b0786https://scholars.lib.ntu.edu.tw/handle/123456789/432414Suppression of interfacial layer in high-K gate stack with crystalline high-K dielectric and AlN buffer layer structurejournal article10.1016/j.matchemphys.2016.09.0542-s2.0-84992754203