Characterization of gadolinium oxide thin films with CF4 plasma treatment for resistive switching memory applications

Wang, Jer-ChyiJer-ChyiWangYe, Yu-RenYu-RenYeLai, Chao-SungChao-SungLaiLin, Chih-TingChih-TingLinLu, Hsin-ChunHsin-ChunLuWu, Chih-I.Chih-I.WuWang, Po-ShengPo-ShengWang2020-06-112020-06-1120130169-4332https://scholars.lib.ntu.edu.tw/handle/123456789/499138Characterization of gadolinium oxide thin films with CF4 plasma treatment for resistive switching memory applicationsjournal article10.1016/j.apsusc.2013.03.122WOS:000318979800071