An effective system for parameter optimization in photolithography process of a LGP stamper.

WEN-CHIN CHENJiang, Xiao-YunXiao-YunJiangChang, Hui-PinHui-PinChangChen, Hisa-PingHisa-PingChen2020-05-042020-05-042014https://scholars.lib.ntu.edu.tw/handle/123456789/490314[SDGs]SDG9An effective system for parameter optimization in photolithography process of a LGP stamper.journal article10.1007/s00521-013-1353-7https://doi.org/10.1007/s00521-013-1353-7